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99 9 high purity boron carbide for b4c sputtering target

99 9 high purity boron carbide for b4c sputtering target

99 9 high purity boron carbide for b4c sputtering target

Tel: 0086(371)86&15&18&27

Mail: [email protected]

99.9% High Purity Boron Carbide For B4c Sputtering Target ...99.9% High Purity Boron Carbide for B4C Sputtering Target. Boron carbide (chemical formula approximately B4C) is an extremely hard boron–carbon ceramic, and covalent material used in tank armor, bulletproof vests, engine sabotage powders, as well as numerous industrial applications. With a Vickers Hardness of >30 GPa, it is one of the hardest known materials, behind cubic boron nitride and diamond.

wholesale Boron Nitride Sputtering Target- FUNCMATER

Boron nitride is a thermally and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice. The hexagonal form corresponding to graphite is the most stable and soft among BN polymorphs. Chemical formulaBNbuy Boron carbide Sputtering Target - FUNCMATERCharacteristic. Boron carbide (chemical formula approximately B 4 C) is an extremely hard boroncarbon ceramic and covalent material, as well as numerous industrial applications. With a Vickers Hardness of >30 GPa, it is one of the hardest known materials, behind cubic boron nitride and diamond.Tungsten Carbide (WC) Sputtering Target | High Purity 99 9 high purity boron carbide for b4c sputtering targetST0221 Boron Carbide (B4C) Sputtering Target SPUTTERTARGETS Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials.

Tungsten Carbide (WC) Sputtering Target | High Purity 99 9 high purity boron carbide for b4c sputtering target

ST0221 Boron Carbide (B4C) Sputtering Target SPUTTERTARGETS Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials.Magnetron sputter deposition of boron and boron carbide 99 9 high purity boron carbide for b4c sputtering targetDec 10, 1991 · Boron film deposition rates of 0.2 nm s~ were achieved with these process parameters and a magnetron sputtering source with a target 6.35 cm in diameter. Boron carbide sputter targets were fabricated from fully dense, high purity (99.9%) Magnetron sputter deposition of boron and boron carbide 99 9 high purity boron carbide for b4c sputtering targetDec 10, 1991 · Boron film deposition rates of 0.2 nm s~ were achieved with these process parameters and a magnetron sputtering source with a target 6.35 cm in diameter. Boron carbide sputter targets were fabricated from fully dense, high purity (99.9%)

Kurt J. Lesker Company | Boron Carbide B4C Sputtering 99 9 high purity boron carbide for b4c sputtering target

BORON CARBIDE TARGET, B4C, 99.5% PURE, 1.00" DIAMETER X 0.125" THICK, +/-0.010" ALL 1.0" Dia. x 0.125" Thick 99 9 high purity boron carbide for b4c sputtering target Boron Carbide Circular Sputter Target 99 9 high purity boron carbide for b4c sputtering target Target Size Purity Bonding Type Backing Plate Size Compatible Guns Notes Part Number Price In Stock Add To Cart; MaterialHigh Purity Boron Carbide (B4C) - ALB Materials IncPictures of High Purity Boron Carbide (B4C): In high purity materials field, purity can be list as 99.999% or 5N(five nine), accordingly, 2N=99%, 2N5=99.5%, 3N=99.9%, 3N5=99.95%, 4N=99.99%, 4N5=99.995%, 6N=99.9999%, 7N=99.99999%, 4N-6N means purity from 99.99% to 99.9999% etc.Graphite/Carbide ProductsBoron Carbide (B4C) Sputtering Targets. Composition: Boron Carbide (B4C) Catalog No.: DPCB5ST Purity: 99.50% Please click for discount and other size Click here for the specifications of B4C sputter target Click here for the SDS document of B4C sputter target

Graphite/Carbide Products

Boron Carbide (B4C) Sputtering Targets. Composition: Boron Carbide (B4C) Catalog No.: DPCB5ST Purity: 99.50% Please click for discount and other size Click here for the specifications of B4C sputter target Click here for the SDS document of B4C sputter targetDeposition of B4C/BCN/c-BN multilayered thin films by r.f 99 9 high purity boron carbide for b4c sputtering targetJan 03, 2006 · Sputtering was performed with 550 W of RF power applied to the targets. The targets consisted of a single-phase 4-in.-diameter and 0.16-in.-thick h-BN disk with purity above 99.9% and a B 4 C (99.5% purity) target with similar dimensions, mounted on a water-cooled CuChina Metal Sputtering Target, Metal Sputtering Target 99 9 high purity boron carbide for b4c sputtering targetChina Metal Sputtering Target manufacturers - Select 2020 high quality Metal Sputtering Target products in best price from certified Chinese Tungsten manufacturers, Solar Energy System suppliers, wholesalers and factory on Made-in-China 99 9 high purity boron carbide for b4c sputtering target, page 6

Carbon Sputtering Targets | C Targets|Graphite Sputtering 99 9 high purity boron carbide for b4c sputtering target

Name: Sign: Purity: Character: Boron carbide. B4C. 99.5. Sputtering Target, Evaporation material, Powders(40-300mesh) Chromium Carbide. Cr3C2. 99.5%. Sputtering 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide Sputtering Target (B4C, Purity: 99.99%) - Boron Carbide Sputtering Target (B4C, Purity: 99.99%) Product No. CAS: Purity: Thickness: Diameter: Shape: Appearance: Melting Point: NRE-43011: 12069-32-8 >99.9%Boron Carbide Powder / B4C Powder (B4C, 1-3um, 99.9%) - Boron Carbide Powder / B4C Powder (B4C, 1-3um, 99.9%) Boron carbide melting point up to 2350oC, boiling point higher than 3500oC, hardness up to 9.3, flexural strength 400Mpa; The product does not react with acid and alkali solution. It has high chemical potential and is one of the most stable materials to acid.

Boron Carbide (B4C) Sputtering Targets, indium, Purity: 99 99 9 high purity boron carbide for b4c sputtering target

Boron Carbide (B4C) Sputtering Targets, indium Purity: 99.5%, Size: 3'', Thickness: 0.125'' Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process with sputter targets is repeatable and can be scaled up from small research and development projects.Sputtering Targets | Vacuum Engineering and Materials CoVEM has sputtering targets available in a wide variety of precious and non-precious materials including pure elements, compounds and alloys in purities ranging from 99.9% to 99Sputtering Targets Supplier-Manufacturer-Thin Film CoatingMay 31, 2012 · AbleTarget Limited provides all kinds of sputtering targets,high purity and density targets,rotatable Targets,alloy targets,pure metal targets and other sputtering coating materials,thin film materials,PVD and CVD coatings and products,now becoming a perfect sputtering targets supplier around the world.

Boron carbide | B4C | 99.5 | target

Materion Advanced Chemicals Boron carbide; Purity: 99.5 , CAS 12069-32-8, Materion Item Number SS-266. Call 414-289-9800 to order.Boron Sputtering Targets (B) - AEM DepositionAEM Deposition: Boron sputtering target supplier and manufacturer in China! Supply B sputtering target for the world. Including planar Boron target and rotary Boron target. Purity: 99.5%. Boron planar target: Length 1-32 inch, Width 1-12 inch. Boron rotary target: Diameter 1-14 inch.Boron Sputtering Targets (B) - AEM DepositionAEM Deposition: Boron sputtering target supplier and manufacturer in China! Supply B sputtering target for the world. Including planar Boron target and rotary Boron target. Purity: 99.5%. Boron planar target: Length 1-32 inch, Width 1-12 inch. Boron rotary target: Diameter 1-14 inch.

Boron Carbide Powder (B4C)

Boron carbide (chemical formula B4C) is an extremely hard ceramic material used in tank armor, bulletproof vests, and numerous industrial applications. With a hardness of 9.3 on the mohs scale, it is one of the hardest materials known, behind cubic boron nitride and diamond.Boron Carbide Nanopowder Detailed Analysis XRD SEM Boron carbide nanopowder possesses high purity, narrow range particle size distribution, larger specific surface area. The melting point of boron carbide nanopowder is up to 2350oC, boiling point higher than 3500 hardness up to 9.3, flexural strength 400Mpa. B 4 C nanoparticle does not react with acid and alkali solution. It has high 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide Nanoparticles Detailed Analysis XRD SEM Boron Carbide Nanoparticles possesses high purity, narrow range particle size distribution, larger specific surface area. The melting point of boron carbide nanopowder is up to 2350oC, boiling point higher than 3500 hardness up to 9.3, flexural strength 400Mpa. B 4 C nanoparticle does not react with acid and alkali solution. It has high 99 9 high purity boron carbide for b4c sputtering target

Boron Carbide BC Sputtering Target | AMERICAN ELEMENTS

American Elements specializes in producing high purity Boron Carbide (BC) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide (B4C) Micron Powder, Purity: 99.95%, Size: 1 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide (B4C) Micron Powder is one of the most versatile material. B4C Powder is among the best choice to be used in grinding, lapping, polishing, refractory products, ceramic parts, and Boron Carbide (B4C) Evaporation Materials | Stanford 99 9 high purity boron carbide for b4c sputtering targetStanford Advanced Materials supplies high-performance Boron Carbide (B4C) Evaporation Materials for your research needs. All for Joomla All for Webmasters (949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Boron Carbide (B4C) sputtering target,sputter target 99 9 high purity boron carbide for b4c sputtering target

Boron Carbide Sputtering targets - B4C . Purity---99.5% Shape--- Discs, Plate, Step ( Dia 480mm, Thickness 1mm) Rectangle, Sheet, Step ( Length410mm,Width 300mm, Thickness 1mm) Tube( Diameter< 300mm, Thickness >2mm, ) Application--- B4C in general are used for wear-resistant films and semi-conducting films.B4C are used as diffusion barriers in both silicon and III-V device 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide (B4C) sputtering target,sputter target 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide Sputtering targets - B4C . Purity---99.5% Shape--- Discs, Plate, Step ( Dia 480mm, Thickness 1mm) Rectangle, Sheet, Step ( Length410mm,Width 300mm, Thickness 1mm) Tube( Diameter< 300mm, Thickness >2mm, ) Application--- B4C in general are used for wear-resistant films and semi-conducting films.B4C are used as diffusion barriers in both silicon and III-V device 99 9 high purity boron carbide for b4c sputtering targetBoron Carbide (B4C) Sputtering Targets - ALB Materials IncALB Materials Inc supply Boron Carbide (B4C) Sputtering Targets and also provide bonding service with high quality at competitive price. 99 9 high purity boron carbide for b4c sputtering target B4C Purity: 99.5% Price($, USD): ($, USD 99 9 high purity boron carbide for b4c sputtering target <32inch, Width<12inch, Thick >1mm Synonyms: Boron Carbide (B4C) Sputtering Targets, B4C Sputtering Target, B4C Sputter Target, B4C Target, Boron Carbide 99 9 high purity boron carbide for b4c sputtering target

Boron Carbide Sputtering Targets (B4C) -AEM Deposition

The use of high density boron and boron carbide (B4C) and a vacuum-brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. Boron Carbide Sputtering Target Information. Boron Carbide Sputtering Target Purity is 99.5%;Boron Carbide Sputtering Target | AMERICAN ELEMENTSSECTION 1. IDENTIFICATION. Product Name: Boron Carbide Sputtering Target Product Number: All applicable American Elements product codes, e.g. BO-C-02-ST , BO-C-025-ST , BO-C-03-ST , BO-C-035-ST , BO-C-04-ST , BO-C-05-ST CAS #: 12069-32-8 Relevant identified uses of the substance: Scientific research and development Supplier details: American Elements 10884 Weyburn Ave.Boron Carbide Sputtering Target B4C MSE Supplies LLCBoron Carbide Sputtering Targets Specifications Purity: 99.5% Density: 2.51g/cc Shape: Discs, Plate, Step ( Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step ( Length1000mm,Width 300mm, Thickness 1mm) Tube( Diameter&lt; 300mm, Thickness &gt;2mm, ) Application: B4C in general are used for wear-resistant films and semi-co

Boron Carbide Sputtering Target B4C MSE Supplies LLC

Boron Carbide Sputtering Targets Specifications Purity: 99.5% Density: 2.51g/cc Shape: Discs, Plate, Step ( Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step ( Length1000mm,Width 300mm, Thickness 1mm) Tube( Diameter&lt; 300mm, Thickness &gt;2mm, ) Application: B4C in general are used for wear-resistant films and semi-coBoron Carbide (B4C) Sputtering Targets | Carbide sputter 99 9 high purity boron carbide for b4c sputtering targetComposition: Boron Carbide (B4C) Catalog No.: DPCB5ST Purity: 99.50% Please click for discount and other size Click here for the specifications of B4C sputter target Click here for the SDS document of B4C sputter targetBoron Carbide (B4C) Sputtering Targets - ALB Materials IncItem Number: ALB-B4C-ST Product Name: Boron Carbide (B4C) Sputtering Targets CAS Number: [12069-32-8] Formula: B4C Purity: 99.5% Price($, USD): ($, USD)Inquiry Supplier:

99.9% High Purity Boron Nitride For Bn Sputtering Target 99 9 high purity boron carbide for b4c sputtering target

99.9% High Purity Boron Nitride for BN Sputtering Target. Boron nitride is a heat- and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice. The hexagonal form corresponding to graphite is the most stable and soft among BN polymorphs, and is therefore 99.9% High Purity Boron Carbide For B4c Sputtering Target 99 9 high purity boron carbide for b4c sputtering target99.9% High Purity Boron Carbide for B4C Sputtering Target. Boron carbide (chemical formula approximately B4C) is an extremely hard boroncarbon ceramic, and covalent material used in tank armor, bulletproof vests, engine sabotage powders, as well as numerous industrial applications. With a Vickers Hardness of >30 GPa, it is one of the hardest known materials, behind cubic boron nitride and diamond.

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